City College of New York
2017-07-09
2017-07-12
Xenocs will be attending theВ 91st annual meeting of the American Chemical Society Division of Colloid and Surface Chemistry.
Let’s meet there !
City College of New York
2017-07-09
2017-07-12
Xenocs will be attending theВ 91st annual meeting of the American Chemical Society Division of Colloid and Surface Chemistry.
Let’s meet there !
Based on worldwide patents and more than 14 years of Research and Development, Xenocs is the only company in the world proposing single reflection multilayer optics. These optics offer typically 50% more efficiency than standard multiple reflection optics, also called Montel optics.
Based on its proprietary replication technology, Xenocs is able to offer innovative optical designs with unmatched performance, which up to now have been impossible to achieve with other existing manufacturing techniques.
| Mirror type | Figure | Optic efficiency (calculated over mirror length for 70µm source) |
| Standard Montel mirrors |  | Eff = 42% |
| Xenocs FOX 3D mirrors |  | Eff = 62% |
| Model | Beam size at focus (mm) with 60 µm source | Divergence (mrad) | Typical application |
| FOX 3D Cu 14-39 (♦) | 0.19 x 0.19 | 5.4 | Protein crystallography (♦) Powder diffraction |
| FOX 3D Cu 12-53 | 0.3 x 0.3 | 3 | Protein crystallography (Long Unit Cells) Powder diffraction |
| FOX 3D Mo 10-31 | 0.13 x 0.13 | 4 | Small molecule crystallography High pressure diffraction |
| FOX 3D Ag 10-30 | 0.13 x 0.13 | 3 | Small molecule crystallography High pressure diffraction |
| FOX 3D Cr 8-30 | 0.20 x 0.20 | 6 | Protein crystallography (S-SAD) Stress analysis |
| FOX 1D Cu 12-53 | 0.3 | 3 | XRD, Powder Diffraction |
| Model | Beam size at focus (mm) with 60 µm source | Divergence (mrad) | Typical application |
| FOX 2D Mo 25-25 (♦) | 0.08 x 0.08 | 5 | Small mollecule crystallography High pressure crystallography |
| FOX 2D Cu 25-25 (♦) | 0.08 x 0.08 | 5.3 | Protein crystallography (♦) Micro Diffraction, Reflectometry |
| FOX 3D Cu 21-21 HC (♦) | 0.08 x 0.08 | 70 x 35 | Rapid x-ray Reflectometry (full beam) Scanning x-ray Reflectometry (with slit) Micro-XRF |
| FOX 3D Cu 28-10 | 0.04 x 0.04 | 17 | Stress Analysis, Micro-diffraction, Micro-XRF |
| FOX 3D Cr 30-8 | 0.04 x 0.04 | 17 | Stress Analysis, Micro-diffraction, Micro-XRF |
| Model | Beam size at focus (mm) with 60 µm source | Divergence (mrad) | Typical application |
| FOX 2D Cu 12-INF (♦) | 1.2 x 1.2 | 1 | Small angle x-ray scattering (♦) High resolution x-ray diffraction (♦) Surface scattering (♦) Thin film analysis (reflectometry stress) (♦) Microdiffraction on synchrotron (♦) |
| FOX 2D Mo 25-INF (♦) | 0.85 x 1.3 | 0.5 | Small angle x-ray scattering High resolution x-ray diffraction Surface scattering |
| FOX 2D 12-60 L (♦) | 0.18 x 0.2 | 0.5 x 2 | High resolution diffraction Small sample analysis |
| FOX 1D Cu 12-INF (♦) | 1.2 | 0.8 | High resolution x-ray diffraction, Powder diffraction, Reflectometry, Small angle x-ray scattering |
| Model | Beam size at focus (mm) with 60 µm source | Divergence (mrad) | Typical application |
| FOX 1D Cu 12-53 | 0.3 | 3 | XRD, Powder Diffraction |
| Model | Beam size at focus (mm) with 60 µm source | Divergence (mrad) | Typical application |
| FOX 1D Cu 12-INF (♦) | 1.2 | 0.8 | High resolution x-ray diffraction, Powder diffraction, Reflectometry, Small angle x-ray scattering |
Based on its extended experience in multilayer coatings, surface shaping, and advanced metrology, Xenocs has developed a broad range of high performance XRF analyzer optics.
With its unique replication technology, Xenocs has developed new analyzer geometries that lead to improved lower limits of detection and increased measurement throughput.
| Element of interest | Reference |
| O, F, Na, Mg, Al, Si, P, S | XAN-1 |
| Nitrogen | XAN-2 |
| Carbon | XAN-3 |
| Boron | XAN-4 |
| Mg, Al , Si | XAN-5 |
| Be | XAN-6 |
Advanced materials research and characterization could require integration of specific or customized sample environments.
Xeuss 3.0 is perfectly adapted for such new projects thanks to its state of the art beamline concept.
It provides:
In particular, the following key features enable the user to optimize experiments or results:
SAXS acquisition continuously without any beamstop provides High Dynamic Range data.
No parasitic scattering from beamstop edges or detector window allows noise-free scattering at low q.
The direct beam is recorded simultaneously with the sample scattering profile during acquisition for accurate transmitted intensity measurement, used to obtain a precise absolute intensity normalization.
In addition, the direct beam profile thus measured is integrated in the data analysis (XSACT) to improve the accuracy of the results.
As a standard solution, Xeuss 3.0 integrates low maintenance microfocus beam delivery systems to provide very high flux levels previously only possible with high power rotating anode sources.
Advanced experiments such as kinetic studies or shape analysis of diluted samples can now be performed in the lab.
In addition, Xenocs X-ray beam delivery systems coupled with motorized scatterless collimation achieve high resolution (low Δq beam), which is essential for studying large characteristic dimensions or for performing accurate mesophase analysis.
The high useful flux together with the high resolution capability are achieved through the combination of:
To ensure the best quality of X-ray scattering measurements, including on diluted or low contrast samples, Xeuss 3.0 combines high flux with low noise technology, which is the fruit of more than 10 years of development.
Key integrated features are:
For applications requiring very fast kinetics Xeuss 3.0 can also be delivered with a MetalJet source.
The Q-Xoom features full range computer-controlled detector travel to automatically adjust the sample-to-detector distance offering maximum flexibility of measurement for experiment optimization.
The virtual detector increases the measuring capabilities offering surfaces of collection larger than 200 mm2 x 200 mm2 at any sample-to-detector distance independently of detector size with automatic data reconstruction.
The large surface of detection is beneficial to optimize the azimuthal coverage in case of anisotropic samples or to benefit from high resolution measurement settings by characterizing smaller length scales (larger wave vectors) at longer sample to detector distance by a detector offset.
Advanced nanomaterials development and design require characterization over a large range of length scales. The Xeuss 3.0 offers such measuring capability over up to 5 orders in magnitude in q (wave vector) through entirely motorized change of configurations. Any trained user can thus operate the system remotely over its complete measurement range for a given sample or batch of samples.
Automatic change of measuring settings include:
– Q-Xoom change of measurement resolution through motorized translation of detector
– Sequential SAXS /USAXS measurement with Bonse-Hart USAXS module
– Change of energy radiation, up to 3 energies
– Movable WAXS detector for out of equilibrium in situ SWAXS studies
