1-3 Allรฉe du Nanomรจtre
38000 Grenoble
France
Phone: +33 4 76 26 95 40
Fax: +33 4 76 26 95 49
Sales Department:ย [email protected]
Customer Support Department:ย [email protected]
Purchase Department: [email protected]
Accounting Department:ย [email protected]
Human Resources Department:ย [email protected]
Discover on the map below where you can find your local Xenocs contact.
You can also find it in the list below.
4 Open Square Way, Suite 101
Holyoke, MA 01040, USA
Phone: +1 413 587 4000
[email protected]
351 Paseo Nuevo, Floor 2
Santa Barbara, CA 93101, USA
Diplomvej 381
2800 Kgs. Lyngby, Denmark
Tiancheng Times Business Plaza 28F, No.58 Qinglonggang Road, Xiangcheng District, Suzhou, China
Xenocs Inc T. +1 413 587 4000 Contact: Scott Barton [email protected]
Xenocs Inc โ West Branch T. +1 805 455-9316 Contact : Matthew Williams [email protected]
Spectramex, S.A. de C.V. T. +52 55 5562 9289 Contact: Guillermo Picco [email protected]
Instrutรฉcnica T. +55 19 3289 9649 Contact: Hugo Vasconcellos [email protected]
Grupo รlava +34 91 56900 Contact: Cristina Gonzรกlez [email protected]
Xenocs SAS T. +33 4 76 26 95 40 [email protected]
Xenocs Nordic. T. +45 31250296 Contact: Sรธren Skou [email protected]
Xenocs SAS M. +48 577 443 771 Contact: Szymon Stolarek [email protected]
Laborsistem SRL T. +40 31 8053 799 Contact: Sorin Buligescu [email protected]
Technoinfo Ltd. T. +7 499 243 66 26 Contact: Oleg KORNEYCHIK [email protected]
Advanced Instruments Technology T. + 202 25203735 Contact : Ahmad Ramadan [email protected]
Xenocs China Scientific Instrument Technology Co. T. 400-159-0509 Contact: [email protected] www.xenocs.cn
Nano Lab Korea Co., Ltd T. +82 70 8822 1203 F. +82 31 212 1203 Contact: Hak-Jun Lee [email protected]
For SAXS solutions: SANYO TRADING CO.,LTD. T. +81.3.3518.1188 Contact : Hiroyuki Matsumiya [email protected] For components: HAYASHI-REPIC CO., LTD. T. +81 3 3918 5110 Contact: Shigeru Morinaga [email protected]
Crea Laboratory Technologies Pty Ltd. T. +61 2 4320 6670 Contact: Chris McCrea [email protected]
2H Instrument Co.,Ltd โ Hanoi Office T. (+84 24) 37911179 Contact: Dr. Hoang Tho Ha [email protected]
2H Saigon Instrument Co.,Ltd โ HCM Office T. (+84 28) 62515650 Contact: Mr. Truong Xuan Vuong [email protected]
MALVA SA Analytical Equipment Supplies & Support T. +30210-8000904 Contact: Dimitris Stamelos [email protected]
Tekafos T. + 90 530 073 6490 Contact: Baran Pekeล [email protected]
Icon Analytical Equipment Pvt. Ltd. T. +91 22 43 45 1600 Contact: Sanjeev Sharma [email protected]
Xenocs T. + 91 892 930 2074 Contact: Ravindra Singh Sales Manager [email protected]
ProLab Systems T. +973 17180507 Contact: Zaid Al Mosheky [email protected]
If your country is not listed below and you wish to contact us, please contact directly Xenocs SAS
[email protected]ย
Xenocs Inc
4 Open Square Way, Suite 101 Holyoke, MA 01040, USA
T. +1 413 587 4000
Contact: Scott Barton
[email protected]
Xenocs Inc โ West Branch
351 Paseo Nuevo, Floor 2 Santa Barbara, CA 93101, USA
T. +1 805 455-9316
Contact: Matthew Williams
[email protected]
Spectramex, S.A. de C.V.
Cto. Circunvalaciรณn Poniente No. 1 Desp. 302 Cd. Satรฉlite, Naucalpan, Edo. de Mรฉxico., CP.53100 Mรฉxico.
T. +52 55 5562 9289
Contact: Guillermo Picco
[email protected]
Instrutรฉcnica
Caixa Postal 6668, Cep: 13084-970 Campinas SP, Av. Santa Izabel, 1.798A, Distr. Barรฃo Geraldo, 13084-643 Campinas SP
T. +55 19 3289 9649
Contact: Hugo Vasconcellos
[email protected]
Tiancheng Times Business Plaza 28F, No.58 Qinglonggang Road, Xiangcheng District, Suzhou, China
T. +400-159-0509
[email protected]
www.xenocs.cn
Xenocs
T. +91 892 930 2074
Contact: Ravindra Singh Rawat
[email protected]
Icon Analytical Equipment Pvt. Ltd.
Icon House, 1st Floor, Plot No.52, Sector 6, Service Industrial Area, Sanpada, Navi Mumbai โ 400 705, India
T. +91 22 43 45 1600
Mob. +91 931 3288 121
Contact: Sanjeev Sharma
[email protected]
For SAXS solutions:
SANYO TRADING CO.,LTD.
2-11 Kanda Nishiki-cho, Chiyoda-ku Tokyo 101-0054, Japan
T. +81.3.3518.1188
Contact : Hiroyuki Matsumiya
[email protected]
For components:
HAYASHI-REPIC CO., LTD.
1-28-3, Kita Otsuka, Toshima-ku Tokyo 170-0004, Japan
T. +81 3 3918 5110
Contact: Shigeru Morinaga
[email protected]
Nano Lab Korea Co., Ltd
#131, U-Tower, 120, Heungdeokjungang-ro, Giheung-gu, Yongin-si Gyeonggi-do, 16950, Korea
T. +82 70 8822 1203
F. +82 31 212 1203
Contact: Hak-Jun Lee
[email protected]
2H Instrument Co.,Ltd โ Hanoi Office
No. 9, Lane 1/52 Pham Tuan Tai, Cau Giay, Hanoi
T. (+84 24) 37911179
F. (+84 24) 37911180
Contact : Dr. Hoang Tho Ha
Mob. (+84)ย 913227302
[email protected]
www.2hinst.com
2H Saigon Instrument Co.,Ltd โ HCM Office
No. F-S16, Carillon building, 171A Hoang Hoa Tham, Ward 13, Tan Binh District, Ho Chi Minh City
T. (+84 28) 62515650
F. (+84 28) 62515651
Contact : Mr. Truong Xuan Vuong
Mob. (+84)ย 913229584
[email protected]
www.2hinst.com
Xenocs SAS
1-3 Allรฉe du Nanomรจtre, 38000 Grenoble, France
T. +33 4 76 26 95 40
F. +33 4 76 26 95 49
[email protected]
Xenocs Nordic ApS
Diplomvej 381, 2800 Kgs. Lyngby, Denmark
T. +45 31250296
Contact: Sรธren Skou
[email protected]
MALVA SA
Analytical Equipment Supplies & Support
13 Ilission Str, GR-14564 N. Kifissia, Greece
T. +30210-8000904
Contact: Dimitris Stamelos
[email protected]
Xenocs SAS
1-3 Allรฉe du Nanomรจtre, 38000 Grenoble, France
M. +48 577 443 771
Contact: Szymon Stolarek
[email protected]
Technoinfo Ltd.
121248, Russia, Moscow Kutuzovsky Prospect 9, building 2a, office 77
T. +7 499 243 66 26
Contact: Oleg KORNEYCHIK
[email protected]
Grupo รlava
Desarrollo de Negocio, รrea de Nanotechnologรญa, Albasanz 16, 28037 Madrid, Spain
T. +34 91 56900
M. +34 600 40 12 11
Contact: Cristina Gonzรกlez
[email protected]
Contact: Antonio Javier Zambrano Mรกrquez
[email protected]
Laborsistem SRL
Str. Crinul de Gradina nr.3, RO-032578 Bucharest 3, Romania
T. +40 31 8053 799
Contact: Sorin Buligescu
[email protected]
Crea Laboratory Technologies Pty Ltd.
Unit 4, 4 Teamster Close, P O BOX 3791, Tuggerah NSW 2259, Australia
T. ย +61 2 4320 6670
M.+61 410 692 579
Contact: Chris McCrea
[email protected]
ProLab Systems
Kuwait Avenue, Al Mahooz, Block 334, Bldg:105, Flat 21
P.O. Box 65023, Manama, Bahrain
T. +973 17180507
Contact: Zaid Al Mosheky
[email protected]ย
Tekafos
Barbaros Mah. Susuz Sok. No: 13/1 Ataลehir / ฤฐstanbul, Tรผrkiye
T. + 90 530 073 6490
Contact: Baran Pekeล
[email protected]
Advanced Instruments Technology
82 Al Amal Extension, Maadi 11431, Cairo, Egypt.
T. + 202 25203735
Contact : Ahmad Ramadan
[email protected]
Based on worldwide patents and more than 14 years of Research and Development, Xenocs is the only company in the world proposing single reflection multilayer optics. These optics offer typically 50% more efficiency than standard multiple reflection optics, also called Montel optics.
Based on its proprietary replication technology, Xenocs is able to offer innovative optical designs with unmatched performance, which up to now have been impossible to achieve with other existing manufacturing techniques.
| Mirror type | Figure | Optic efficiency (calculated over mirror length for 70ยตm source) |
| Standard Montel mirrors |  | Eff = 42% |
| Xenocs FOX 3D mirrors |  | Eff = 62% |
| Model | Beam size at focus (mm) with 60 ยตm source | Divergence (mrad) | Typical application |
| FOX 3D Cu 14-39 (โฆ) | 0.19 x 0.19 | 5.4 | Protein crystallography (โฆ) Powder diffraction |
| FOX 3D Cu 12-53 | 0.3 x 0.3 | 3 | Protein crystallography (Long Unit Cells) Powder diffraction |
| FOX 3D Mo 10-31 | 0.13 x 0.13 | 4 | Small molecule crystallography High pressure diffraction |
| FOX 3D Ag 10-30 | 0.13 x 0.13 | 3 | Small molecule crystallography High pressure diffraction |
| FOX 3D Cr 8-30 | 0.20 x 0.20 | 6 | Protein crystallography (S-SAD) Stress analysis |
| FOX 1D Cu 12-53 | 0.3 | 3 | XRD, Powder Diffraction |
| Model | Beam size at focus (mm) with 60 ยตm source | Divergence (mrad) | Typical application |
| FOX 2D Mo 25-25 (โฆ) | 0.08 x 0.08 | 5 | Small mollecule crystallography High pressure crystallography |
| FOX 2D Cu 25-25 (โฆ) | 0.08 x 0.08 | 5.3 | Protein crystallography (โฆ) Micro Diffraction, Reflectometry |
| FOX 3D Cu 21-21 HC (โฆ) | 0.08 x 0.08 | 70 x 35 | Rapid x-ray Reflectometry (full beam) Scanning x-ray Reflectometry (with slit) Micro-XRF |
| FOX 3D Cu 28-10 | 0.04 x 0.04 | 17 | Stress Analysis, Micro-diffraction, Micro-XRF |
| FOX 3D Cr 30-8 | 0.04 x 0.04 | 17 | Stress Analysis, Micro-diffraction, Micro-XRF |
| Model | Beam size at focus (mm) with 60 ยตm source | Divergence (mrad) | Typical application |
| FOX 2D Cu 12-INF (โฆ) | 1.2 x 1.2 | 1 | Small angle x-ray scattering (โฆ) High resolution x-ray diffraction (โฆ) Surface scattering (โฆ) Thin film analysis (reflectometry stress) (โฆ) Microdiffraction on synchrotron (โฆ) |
| FOX 2D Mo 25-INF (โฆ) | 0.85 x 1.3 | 0.5 | Small angle x-ray scattering High resolution x-ray diffraction Surface scattering |
| FOX 2D 12-60 L (โฆ) | 0.18 x 0.2 | 0.5 x 2 | High resolution diffraction Small sample analysis |
| FOX 1D Cu 12-INF (โฆ) | 1.2 | 0.8 | High resolution x-ray diffraction, Powder diffraction, Reflectometry, Small angle x-ray scattering |
| Model | Beam size at focus (mm) with 60 ยตm source | Divergence (mrad) | Typical application |
| FOX 1D Cu 12-53 | 0.3 | 3 | XRD, Powder Diffraction |
| Model | Beam size at focus (mm) with 60 ยตm source | Divergence (mrad) | Typical application |
| FOX 1D Cu 12-INF (โฆ) | 1.2 | 0.8 | High resolution x-ray diffraction, Powder diffraction, Reflectometry, Small angle x-ray scattering |
Based on its extended experience in multilayer coatings, surface shaping, and advanced metrology, Xenocs has developed a broad range of high performance XRF analyzer optics.
With its unique replication technology, Xenocs has developed new analyzer geometries that lead to improved lower limits of detection and increased measurement throughput.
| Element of interest | Reference |
| O, F, Na, Mg, Al, Si, P, S | XAN-1 |
| Nitrogen | XAN-2 |
| Carbon | XAN-3 |
| Boron | XAN-4 |
| Mg, Al , Si | XAN-5 |
| Be | XAN-6 |
Advanced materials research and characterization could require integration of specific or customized sample environments.
Xeuss 3.0 is perfectly adapted for such new projects thanks to its state of the art beamline concept.
It provides:
In particular, the following key features enable the user to optimize experiments or results:
SAXS acquisition continuously without any beamstop provides High Dynamic Range data.
No parasitic scattering from beamstop edges or detector window allows noise-free scattering at low q.
The direct beam is recorded simultaneously with the sample scattering profile during acquisition for accurate transmitted intensity measurement, used to obtain a precise absolute intensity normalization.
In addition, the direct beam profile thus measured is integrated in the data analysis (XSACT) to improve the accuracy of the results.
As a standard solution, Xeuss 3.0 integrates low maintenance microfocus beam delivery systems to provide very high flux levels previously only possible with high power rotating anode sources.
Advanced experiments such as kinetic studies or shape analysis of diluted samples can now be performed in the lab.
In addition, Xenocs X-ray beam delivery systems coupled with motorized scatterless collimation achieve high resolution (low ฮq beam), which is essential for studying large characteristic dimensions or for performing accurate mesophase analysis.
The high useful flux together with the high resolution capability are achieved through the combination of:
To ensure the best quality of X-ray scattering measurements, including on diluted or low contrast samples, Xeuss 3.0 combines high flux with low noise technology, which is the fruit of more than 10 years of development.
Key integrated features are:
For applications requiring very fast kinetics Xeuss 3.0 can also be delivered with a MetalJet source.
The Q-Xoom features full range computer-controlled detector travel to automatically adjust the sample-to-detector distance offering maximum flexibility of measurement for experiment optimization.
The virtual detector increases the measuring capabilities offering surfaces of collection larger than 200 mm2 x 200 mm2 at any sample-to-detector distance independently of detector size with automatic data reconstruction.
The large surface of detection is beneficial to optimize the azimuthal coverage in case of anisotropic samples or to benefit from high resolution measurement settings by characterizing smaller length scales (larger wave vectors) at longer sample to detector distance by a detector offset.
Advanced nanomaterials development and design require characterization over a large range of length scales. The Xeuss 3.0 offers such measuring capability over up to 5 orders in magnitude in q (wave vector) through entirely motorized change of configurations. Any trained user can thus operate the system remotely over its complete measurement range for a given sample or batch of samples.
Automatic change of measuring settings include:
– Q-Xoom change of measurement resolution through motorized translation of detector
– Sequential SAXS /USAXS measurement with Bonse-Hart USAXS module
– Change of energy radiation, up to 3 energies
– Movable WAXS detector for out of equilibrium in situ SWAXS studies
The Nano-inXider features a smart dual detector design to detect atomic scale information and nanostructure simultaneously within one exposure. Long sample-to-detector distance for measuring large characteristic dimensions is achieved in SAXS through a vertical design with a small footprint.
Such configuration provides unique benefits:
With the Nano-inXider, the sample and the detectors are fixed. The optional WAXS detector extends the scattering range from the SAXS detector seamlessly throught 2ฦ=60ยฐ.
Such a unique vertical design provides unique benefits:
For anisotropic samples like fibers or oriented films, the Nano-inXider is equipped with a sample rotation stage that acquires the anisotropic scattering. The automatic acquisition involves the following steps:
The SAXS community relies on multiple algorithms with custom models and many different applications. XSACT offers a unified, versatile and complete data processing solution to get things done as fast as possible.
The low cost of ownership of the Nano-inXider mainly comes from its compactness and low cost of operation
The Nano-inXider acquires high signal to noise data by measuring the intense direct beam transmitted through the sample together with lowย intensity signal scattered from the sample.
Direct beam measurement, achieved with innovative beamstop-less data acquisition, enables automatic data treatment and display in absolute intensity with a very high accuracy.
Simultaneous low intensity signals detection is rendered possible by implementation of Clean Beam Technology.
The high dynamic range of intensity collection directly impacts data quality by:
– Enabling the detection of low intensity scattered signal from weakly scattering samples
– Accessing absolute quantity parameters such as particles number, molar mass, concentration, specific surface
– Detecting large characteristic dimensions without need of user data treatment
The Nano-inXider integrates 15 years of R&D in the field of advanced components and instrument design to achieve an optimized balance of high X-ray flux on sample together with low parasitic scattering generated by the instrument.
Clean Beam Technology embeds the following key components and features:
The Nano-inXider measures SAXS without any beamstop and simultaneously collects the direct beam transmitted through the sample together with the scattered signal down to very low intensity levels.
Such high dynamic range data collection is rendered possible by innovative beamstop-less data acquisition.
The direct beam is recorded all along the acquisition, which leads to an accurate transmitted measurement used to obtain a precise absolute intensity normalization.
In addition, the measured direct beam profile (resolution function) is integrated in the data analysis to improve results quality.
Xenocs beamstop-less data acquisition integrates automatic qmin determination depending on the sample and benefits from no parasitic scattering from beamstop edges for high data quality at low q.
Automatic cosmic background removal reduces the impact of ambient parasitic scattering.
For the best understanding of output data, a scientist must have the tools to visualize, exchange and compare numerous graphical representations.
By combining data processing with advanced visualization capabilities, XSACT speeds up your workflow from acquisition to publication.
With the BioXolver you get:
Due to weak scattering from biological samples, high quality SAXS measurements require an instrument optimized for maximum X-ray intensity and lowest possible background noise. The BioXolver offers a unique combination of both capability in particular with:
The BioXolver can be installed with different source options.
It can integrate a MetalJet source to obtain the highest X-ray beam intensity possible in a laboratory instrument.
It can also be installed with the Genix3D, a bright microfocus low maintenance source with intensity levels only previously accessible with high power rotating anode sources. Such performance is achieved by combining the Genix3D long lasting source with new patented FOX 3D multilayer optics having a very high solid angle.
The BioXolver comes with windowless hybrid photon counting (HPC) detectors which allows for beamstopless measurements.
By operating without beamstop the direct beam is recorded all along the acquisition, which leads to an accurate transmission measurement used to obtain a precise absolute intensity normalization.
Moreover, operating without beamstop reduces the lowest scattering angle achievable as it is no more limited by beamstop size but is sample dependent.
The BioXolver uses state of the art collimation slits that greatly reduce noise and provide a clean beam.
High quality detection is achieved with hybrid photon counting (HPC) detectors integrated inside vacuum with no interfering window in front of detector sensor (windowless detector). This ensures that weakly scattering samples can also be measured at low concentrations.
Overall measuring background level of the instrument is further improved by proprietary automatic cosmic background removal algorithms suppressing high energy cosmics hitting the detector.
With the BioXolver standard well plates can be loaded & measured automatically using in-line pipetting robot & automated software suite for high user benefits.
The BioXolver includes powerful data reduction BioXTAS RAW widely used by the BioSAXS community.
It enables standard data operation and data analysis (Rg, molecular weight, etc.), together with advanced analysis using ATSAS plugins.
For high throughput analysis, the automated analysis function analyzes and compiles the results for you.
Sample size separation using size-exclusion chromatography in combination with the BioXolver can not only be used to ensure clean monodisperse samples, but also facilitates research on structurally heterogeneous & aggregation-prone multi-domain proteins as well as heterogeneous protein complexes in dynamic equilibria.
The BioXolver will work with any HPLC system, simply position the HPLC next to the instrument and hook up the column to the BioCUBE flow cell. The in-line UV/Vis ensures accurate determination of the sample concentration exactly at the SAXS exposure position. The included analysis software automatically reduces and provides an easy overview of your entire SEC-SAXS run and makes further analysis easy.
In situ UV measurement directly in the measurement cell provides concentration information of the sample before and after X-ray exposure or during a SEC-SAXS experiment.
This is especially important in this case as the sample is diluted in the transport path from the (HPLC) column exit to the x-ray exposure position.
XSACT็ๆบ่ฝๅ่ฎพ่ฎกไธบๆจๅธฆๆฅไบ็ฎๅ็ๅทฅไฝๆต็จ๏ผๅนถ้่ฟๅผบๅคง็ๅพๅฝขไบคไบๅ่ฝๅธฎๅฉๆจ่ทๅพ็ปๆใ
XSACT็ๆบ่ฝๅ่ฎพ่ฎกไธบๆจๅธฆๆฅไบ็ฎๅ็ๅทฅไฝๆต็จ๏ผๅนถ้่ฟๅผบๅคง็ๅพๅฝขไบคไบๅ่ฝๅธฎๅฉๆจ่ทๅพ็ปๆใ
้่ฟBioXolver๏ผๆจๅฏไปฅๅพๅฐ๏ผ
็ฑไบ็็ฉๆ ทๅ็ๅพฎๅผฑๆฃๅฐ๏ผ้ซ่ดจ้็SAXSๆต้้่ฆไธๅฐไปชๅจๆฅ่พพๅฐๆๅคงXๅฐ็บฟๅผบๅบฆๅๅฐฝๅฏ่ฝไฝ็่ๆฏๅช้ณใ้่ฟไปฅไธๆๆฏ็็ปๅ๏ผBioXolverๅ ทๅคไบ่ฟไธค็ง็ฌ็น็ๅ่ฝ:
BioXolverๅฏไปฅ้ ๅคไธๅ็ๅ ๆบใ
ๅฏไปฅ็ปๅMetalJetๅ ๆบ๏ผๅจๅฎ้ชๅฎคไปชๅจไธญ่ทๅพๅฐฝๅฏ่ฝ้ซ็Xๅฐ็บฟๅ ๆๅผบๅบฆใ
ไนๅฏไปฅๅฎ่ฃ Genix3D๏ผไธ็งไฝ็ปดๆคๆๆฌ็้ซไบฎๅบฆๅพฎ่็ฆๅ ๆบ๏ผๅ ถๅผบๅบฆไปฅๅๅชๆ้ซๅ็้ณๆ่ฝฌ้ถๆ่ฝ่พพๅฐใ่ฟ็งๆง่ฝ้่ฟ็ปๅGenix3D่็จๅ ๆบไธๅ ทๆ่ถ ้ซ็ซไฝ่งใๆฐ็ไธๅฉFOX 3Dๅคๅฑ่่็ฆ้ๅฎ็ฐใ
BioXolver้ ๅคไบๆ ็ชๅฃ่ๆททๅๅ ๅญ๏ผHPC๏ผๆขๆตๅจ๏ผ่ฝๅคๅฎ็ฐๆ beamstopๆต่ฏใ
ๅจๆ beamstopๆ ๅตไธ๏ผๆดไธชๆต่ฏ่ฟ็จไธญไธ็ด่ฎฐๅฝ็ด้ๅ ๏ผ้่ฟๅ็กฎ็้ๅฐๆต่ฏๆฅๅพๅฐๅ็กฎ็็ปๅฏนๅผบๅบฆๆ กๆญฃใ
ๆญคๅค๏ผ็ฑไบไธๅbeamstopๅฐบๅฏธ้ๅถ๏ผ่ๅชไธๆ ทๅๆๅ ณ๏ผๆ beamstpๆต่ฏๅฏๅพๅฐๆดๅฐ็ๆๅฐๆฃๅฐ่งๅบฆใ
BioXolver้็จไบๆๅ ่ฟ็ๅ็ด็ญ็ผ๏ผๆๅคงๅฐ้ไฝไบๅช้ณ๏ผไป่ๅพๅฐไบ็บฏๅๅ ๆใ
้่ฟๅจ็็ฉบไธญๅฉ็จๆททๅๅ ๅญ่ฎกๆฐ๏ผHPC๏ผๆขๆตๅจ๏ผไธๆขๆตๅจไผ ๆๅจ๏ผๆ ็ชๅฃ่ๆขๆตๅจ๏ผๅ้ขๆ ๅนฒๆฐ๏ผๅฎ็ฐไบ้ซ่ดจ้็ๆฃๆตใ่ฟๅฏ็กฎไฟๅผฑๆฃๅฐๆ ทๅไนๅฏไปฅๅจไฝๆตๅบฆไธๆต้ใ
้็จไธ็จ็ๅฎๅฎ่ๆฏ่ชๅจๅป้คๆณ๏ผๆๅถ้ซ่ฝๅฎๅฎๅฐ็บฟ๏ผ่ฟไธๆญฅ้ไฝไบไปชๅจๆดไฝ็่ๆฏๅช้ณใ
BioXolver็ปๅไบๅฐบๅฏธๆ้ป่ฒ่ฐฑๆณๆฅ่ฟ่กๅบๅซๆ ทๅๅคงๅฐ๏ผไธไป ๅฏไปฅไฟ่ฏๆ ทๅๅฎๅ จๅๅๆฃ๏ผ่ฟ่ฝไฟ่ฟๅฏน็ปๆๅผ่ดจไธๆไบ่้็ๅคๅ่็ฝไปฅๅๅจๆๅนณ่กกไธญๅผ่ดจ่็ฝๅคๅ็ฉ็็ ็ฉถใ
BioXolver้็จไบไปปไฝHPLC็ณป็ป๏ผๅช้ๅฐHPLC็ฝฎไบไปชๅจๆ่พน๏ผๅนถๅฐ่ฒ่ฐฑๆฑ่ฟๆฅๅฐBioCUBEๆตๅจๆฑ ใๅจ็บฟUV/Vis่ฝๅค็กฎไฟๅจSAXSๆๅ ไฝ็ฝฎ็ฒพ็กฎๆต้ๆ ทๅๆตๅบฆใ่ชๅธฆ็ๅๆ่ฝฏไปถๅฏ่ชๅจ็ฎๅๆฆ่ฟฐๆดไธชSEC-SAXS่ฟ่ก่ฟ็จ๏ผ่ฟไฝฟๅพ่ฟไธๆญฅๅๆๆดๅ ๅฎนๆใ
็ฑไบๅไฝUVๆต่ฏ็ดๆฅๅจๆต่ฏๆฑ ่ฟ่ก๏ผๅจXๅฐ็บฟๆๅ ไนๅๅไนๅๆๅจSEC-SAXSๆต่ฏไธญ้ฝ่ฝๅพๅฐๆ ทๅ็ๆตๅบฆไฟกๆฏใ
ๅ ไธบๆ ทๅๅจไป(HPLC)ๆฑๅบๅฃๅฐXๅฐ็บฟๆๅ ไฝ็ฝฎ็ไผ ่พ่ฟ็จไธญไผ่ขซ็จ้๏ผๆไปฅๅจ่ฟ็งๆ ๅตไธ๏ผ่ฟไธ็นๅฐคไธบ้่ฆใ
้่ฟๅ ็ฝฎ็งปๆถฒๆบๆขฐ่๏ผๆฏ็ป็ฎกๆตๅจๆฑ BioCUBEไปฅๅๆบๆขฐ่ง่ง็็ปๅๅฏนๆ ทๅ่ฟ่ก็ๆต๏ผ็กฎไฟไบๅฐ้ๆ ทๅ็้ซ็ฒพๅบฆๅฎไฝใ
ๅจไธๅ็ฏๅขๆๆตๅบฆไธๆ ทๅๆปๆถ่ไฝ๏ผๅฏน็็ฉ็ปๆ็ ็ฉถ้ๅธธๆ็ใ
ๆ ็ฎกๆไฝ็กฎไฟๆ ทๅๆถ่้ไฝ่ณ5 ฮผlใ่ฟๅจๅ็ฑปไปชๅจไธญๆฏ็ฌไธๆ ไบ็ใ
ๆฏไธชๆ ทๅ้ฆๅ ็ฑๆ ็ฎก็งปๆถฒๆบๆขฐ่่ชๅจๆณจๅ ฅๅฐBioCUBEๆต้ๆฑ ไธญ๏ผ็ถๅๅฎไฝๅฐๅ ๆไธญ่ฟ่กๆต้๏ผๅนถๅฎๆถๅฏนๅ ถไฝ็ฝฎ่ฟ่ก่ฟ็ปญๆงๅถใ
ๆ ทๅๅจๅญ็ไธญๅจๅญๆ้ดๅๅจBioCUBEๆต่ฏๆ้ด้ฝๅง็ปไฟๆๅจ้ๅฎ็ๆธฉๅบฆไธใ
ๆจ่ฟๅฏไปฅ้ๆฉๅ ทๆ้ๆUV/Visๅ่ฝ็BioCUBEใ
ๅฉ็จๆบๆขฐ่ง่งๆๆฏ๏ผBioXolver่ฝๅค้ๆถๅฏนๆ ทๅ่ฟ่กๆฐๅญๅ็ๆงใ
ๆ ทๅ่ฃ ่ฝฝๅๅฐฑไผ่ขซๅ็กฎๅฐๅฎไฝๅจXๅฐ็บฟๅ ๆไธญ๏ผๅๆถๆ็ปญๅ้ฆ็ปๆ็ป่ชๅจๆงๅถ่ฝฏไปถๆฅไฟๆๅ ๆไธญ็ๆ ทๅ้ไธๅใ
SAXS็จๆท็พคๅพๅไบๅ ทๆ่ชๅฎไนๆจกๅๅๅค็งไธๅๅบ็จ็จๅบ็็ฎๆณใXSACTๆไพ็็ปไธใๅ จ้ขไธๅฎๆด็ๆฐๆฎๅค็่งฃๅณๆนๆกๅฏๅฐฝๅฟซๅฎๆไปปๅกใ
Nano-inXider็ฌ็น็ๆบ่ฝๅๅๆขๆตๅจ่ฎพ่ฎก๏ผๅฏไปฅๅจไธๆฌกๆๅ ๅ ๅๆถๆฃๆตๅฐๅๅญๅฐบๅบฆไฟกๆฏๅ็บณ็ฑณ็ปๆใ่ฎพๅคๅ ๅฐ้ข็งฏๅฐ็ๅ็ด่ฎพ่ฎก๏ผๆ ทๅๅฐๆขๆตๅจ่ท็ฆป้ฟ๏ผๅฏไปฅๆต้ๅคง็็นๅพๅฐบๅฏธใ
่ฟไบ้ ็ฝฎๅฏไปฅๆไพไปฅไธ็ฌ็น็ไผๅฟ๏ผ
Nano-inXider็ๆ ทๅๅๆขๆตๅจ้ฝๆฏๅบๅฎ็ใๅฏ้็WAXSๆขๆตๅจ้ ็ฝฎๆฉๅคงไบๆฃๅฐ่ๅด๏ผๅฏไปฅๆ ็ผ่กๆฅSAXSๆขๆตๅจ๏ผๅพๅฐ็ๆฐๆฎ่พพๅฐ2ฮธ=60ยฐใ
่ฟ็ฌ็น็ๅ็ด่ฎพ่ฎกๆไปฅไธไผๅฟ๏ผ
ๅฏนไบ็บค็ปดๆๅๅ่่็ญๅๅๅผๆงๆ ทๅ๏ผNano-inXider้ ๅคไธไธชๆ ทๅๆ่ฝฌๅฐๅฏไปฅ่ทๅพๅๅๅผๆงๆฃๅฐไฟกๅทใ่ชๅจ้้ๅ ๆฌไปฅไธๆญฅ้ชค:
Nano-inXiderๅฏไปฅ้่ฟๆต้้่ฟๆ ทๅ็ๅผบ็ด้ๅ
ๅๆ ทๅ็ไฝๆฃๅฐๅผบๅบฆไฟกๅทๆฅ่ทๅพ้ซไฟกๅชๆฏๆฐๆฎใ
้่ฟๅ
่ฟ็ๆ beamstopๆฐๆฎ้้่ฟ่ก็ด้ๅ
ๆต้๏ผ่ชๅจๅค็ๆฐๆฎๅนถ่ทๅพๅ็กฎๅบฆ้ซ็็ปๅฏนๅผบๅบฆใ
็บฏๅๅ
ๆๆฏๅฏไปฅๅฎ็ฐๅๆถๆฃๆตไฝๅผบๅบฆไฟกๅทๅ้ซๅผบๅบฆไฟกๅทใ
ๅผบๅบฆ้้็้ซๅจๆ่ๅด็ดๆฅๅฝฑๅๆฐๆฎ่ดจ้๏ผ
– ่ฝๅคๆฃๆตๅผฑๆฃๅฐๆ ทๅ็ไฝๅผบๅบฆๆฃๅฐไฟกๅท
– ๅฎ้่ทๅพ็ฒๅญๆฐใๆฉๅฐ่ดจ้ใๆตๅบฆใๆฏ่กจ้ข็งฏ็ญๅๆฐ
– ๆขๆตๅคง็นๅพๅฐบๅฏธ๏ผๆ ้็จๆท่ฟ่กๆฐๆฎๅค็
Nano-inXider้่ฟๅจๅ ่ฟ็ปไปถๅไปชๅจ่ฎพ่ฎกไธ้ฟ่พพ15ๅนด็็ ๅ๏ผ่พพๅฐไบๅจๆ ทๅไธ้ซXๅฐ็บฟ้้ไธไปชๅจไบง็็ไฝๅฏ็ๆฃๅฐ็ๆไฝณๅนณ่กกใ
็บฏๅๅ ๆๆฏๅ ทๆไปฅไธไธป่ฆ็ปไปถๅ็น็น๏ผ
Nano-inXiderๆ ้ไปปไฝbeamstopๅฐฑๅฏไปฅ่ฟ่กSAXSๆต้๏ผ่ฟๅฏไปฅๅๆถ้้้่ฟๆ ทๅ็็ด้ๅ ๅ้ๅธธไฝๅผบๅบฆๆฃๅฐไฟกๅทใ
้่ฟๅ ่ฟ็ๆ beamstopๆฐๆฎ้้ๅฏๅฎ็ฐ้ซๅจๆ่ๅด็ๆฐๆฎๆถ้ใ
ๅจๆดไธช็้้่ฟ็จไธญ่ฎฐๅฝ็ด้ๅ ๏ผไฝฟ้ๅฐๆต่ฏๆดๅ็กฎ๏ผไป่ไฝฟ็ปๅฏนๆฃๅฐๅผบๅบฆๆ กๆญฃๆดๅ็กฎใ
ๅฆๅค๏ผ่ขซๆต้็็ด้ๅ ๏ผๅ่พจ็ๅฝๆฐ๏ผไผ่ขซๆดๅๅฐๆฐๆฎๅๆไธญๆฅๆ้ซๆต้็ปๆ็่ดจ้ใ
Xenocsๆ beamstopๆฐๆฎ้้ๅฎ็ฐไบๅๅณไบๆ ทๅ็่ชๅจqminๆต้๏ผๅนถไธๆถ้คไบbeamstop่พน็ผ็ๅฏ็ๆฃๅฐ๏ผไป่ๅจไฝqๅบๅ่ทๅพ้ซ่ดจ้ๆฐๆฎใ
่ชๅจๅป้คๅฎๅฎ่ๆฏๅฏไปฅๅๅฐ็ฏๅขๅฏ็ๆฃๅฐ็ๅฝฑๅใ
ๅ ่ฟ็บณ็ฑณๆๆ็ๅๅฑๅ่ฎพ่ฎก้่ฆๅจ่ถ ๅคง็บณ็ฑณๅฐบๅบฆ่ๅดไธ่ฟ่ก่กจๅพใXeuss 3.0ๅ ทๅค่ฟๆ ท็ๆต่ฏ่ฝๅ๏ผ้่ฟๅฎๅ จ่ชๅจๆนๅ้ ็ฝฎ๏ผ้้็ๆฃๅฐ็ข้qๅฏ่ทจ่ถ5ไธชๆฐ้็บงใๅ ๆญค๏ผๅฏนไบ็ปๅฎ็ๅไธชๆๆน้ๆ ทๅ๏ผไปปไฝ็ป่ฟๅน่ฎญ็็จๆท้ฝๅฏไปฅๅจๅฎๆด็ๆต้่ๅดๅ ่ฟ็จๆไฝ็ณป็ปใ
ๅฏ่ชๅจๆดๆน็ๆต้่ฎพ็ฝฎๅ ๆฌ๏ผ
– Q-Xoom้่ฟๆขๆตๅจๆฒฟๅ
่ทฏ็่ชๅจๅนณ็งปๆฅๆนๅๆต้ๅ่พจ็
-ไฝฟ็จBonse Hart USAXSๆจกๅๅฏไปฅๅฎ็ฐ่ฟ็ปญ็SAXS/USAXSๆต้
– Xๅ
ๆบ่ฝ้ๅฏ้๏ผๆไพ3ไธชๅฏ้ๅ
ๆบ
– ็จไบๅไฝSWAXS็ ็ฉถ็ๅฏ็งปๅจWAXSๆขๆตๅจ
ๅฐคๅ ถ๏ผไปฅไธๅ ณ้ฎ็น็นไฝฟ็จๆทๅพไปฅไผๅๆไฝณ็ๅฎ้ชๅ็ปๆ:
ๆ beamstop่ฟ็ปญ้้้ซๅจๆ่ๅดSAXSๆฐๆฎใ
ๆ็ปๆฅ่ชBeamstop่พน็ผๆๆขๆตๅจ็ชๅฃ่็ๅฏ็ๆฃๅฐ๏ผไฝฟไฝqๅค็ๆฃๅฐไฟกๅทไธๅๅนฒๆฐใใ
ๅจ้้่ฟ็จไธญๅๆถ่ฎฐๅฝ็ด้ๅ ๅๆ ทๅๆฃๅฐไฟกๅท๏ผๅพๅฐ็ฒพ็กฎ็้ๅฐๅผบๅบฆ๏ผ็จไบ่ทๅ็ฒพ็กฎ็็ปๅฏนๅผบๅบฆๆ กๆญฃใ
ๅฆๅค๏ผ้้็็ด้ๅ ไฟกๅทๅฐๆดๅๅฐๆฐๆฎๅๆ่ฝฏไปถ๏ผXSACT๏ผ๏ผๆ้ซ่งฃๆ็ปๆ็ๅ็กฎๆงใ
ไฝไธบไธไธชๆ ๅ็่งฃๅณๆนๆก๏ผXeuss 3.0้ๆไฝ็ปดๆคๆๆฌ็้ซๆง่ฝๅพฎ่็ฆๅ
ๆบ๏ผไบฎๅบฆ่พพๅฐไบไนๅ้ซๅ็ๆ่ฝฌ้ณๆ้ถๅ
ๆบๆ่ฝๅฎ็ฐ็ๆฐดๅนณใ
็ฐๅจๅฎ้ชๅฎคไธญๅฐฑๅฏ่ฟ่ก่ฏธๅฆๅจๅๅญฆ็ ็ฉถๆ็จ้ๆ ทๅ็็บณ็ฑณ็ฒๅญๅฝข็ถๅๆ็้ซ็บงๅฎ้ชใ
ๅฆๅค๏ผ้่ฟ็ปๅXenocsๅ ฌๅธ็Xๅฐ็บฟๅ ๆๅ่ชๅจๆ ๆฃๅฐๅ็ด็ณป็ปๅฎ็ฐ้ซๅ่พจ็๏ผๅ ๆฮqไฝ๏ผ๏ผ่ฟๅฏน็ ็ฉถๅคง็นๅพๅฐบๅฏธ็ๆ ทๅๆ่ฟ่กๅ็กฎไธญ้ด็ธ็ๅๆ้ฝ้ๅธธ้่ฆใ
้่ฟไปฅไธ็ปๅๅฎ็ฐ้ซๅ ้้ๅ้ซๅ่พจ็๏ผ
ไธบไบไฟ่ฏXๅฐ็บฟๆฃๅฐ็ๆไฝณๆต่ฏ่ดจ้๏ผๅ ๆฌ็จ้็ๆๅฏนๆฏๅบฆไฝ็ๆ ทๅ๏ผXeuss 3.0ๅฐ10ๅคๅนด็ ๅ็้ซๅ ้้ๅไฝๅช้ณๆๆฏ็ธ็ปๅใ
ไธป่ฆ้ๆๅ่ฝๅ ๆฌ๏ผ
้ ๅคMetalJetๅ ๆบ๏ผ็จไบ้ๅธธๅฟซ็ๅจๅๅญฆ็ ็ฉถใ
Q-Xoom้็จ็ต่ๆงๅถๆขๆตๅจๅ จ็จ็งปๅจ๏ผ่ชๅจ่ฐ่ๆ ทๅๅฐๆขๆตๅจ่ท็ฆป๏ผๆไพๆๅคง็ๆต่ฏ็ตๆดปๆงๆฅไผๅๅฎ้ชใ
่ๆๆขๆตๅจๅขๅผบๆต่ฏ่ฝๅ๏ผๅจไปปๆ็ๆ ทๅๅฐๆขๆตๅจ่ท็ฆปไธ๏ผ็ปๅๅพ่ฐฑ้ๆๆๆฏ๏ผไปปไฝ่งๆ ผ็ๆขๆตๅจ็้้้ข็งฏ้ฝๅฐๅคงไบ200 mm2 x 200 mm2ใ
่ถ ๅคงๆขๆต้ข็งฏๆๅฉไบไผๅๅๅๅผๆงๆ ทๅไฟกๅท็ๆนไฝ่ง่ฆ็๏ผ่ฟๆๅฉไบ้ซๅ่พจ็ๆต่ฏ๏ผไพๅฆๅจ่ท็ฆปๆ ทๅ่พ่ฟๅค็จๅ็ฝฎ็ๆขๆตๅจ้้ๅฐๆดๅคง็ๆฃๅฐ็ข้๏ผไปฅ่กจๅพ่พๅฐ็ๅฐบๅบฆใ
ๅ
่ฟๆๆ็็ ็ฉถๅ่กจๅพ้่ฆ้ๆ็นๅฎ็ๆๅฎๅถ็ๆ ทๅ็ฏๅขใ
็ฑไบๅ
ถๅ
่ฟ็็บฟ็ซ็ๅฟต๏ผXeuss 3.0้ๅธธ้็จไบ่ฟ็งๆฐ้กน็ฎใ
ๅ ๆฌ๏ผ
Xenocsๅบไบๅ จ็ไธๅฉๅ่ถ ่ฟ14ๅนด็็ ๅ๏ผๆไธบไธ็ไธๅฏไธไธๅฎถๆไพๅๅๅฐๅคๅฑ่็ฆ้็ๅ ฌๅธใ่ฟไบ่็ฆ้็ๆ็้ๅธธๆฏๆ ๅ็ๅคๅๅฐ่็ฆ้๏ผไน็งฐไธบMontel่็ฆ้๏ผ้ซๅบ50%ใ
ๅบไบไธๆ็ๅ ๅๅฐๆๆฏ๏ผXenocs่ฝๅคๆไพๅ ทๆๅผบๅคงๆง่ฝ็ๅๆฐ่็ฆ้่ฎพ่ฎก๏ผ่ฟๆฏ่ฟไปไธบๆญขๅ ถไป็ฐๆๅถ้ ๆๆฏๆ ๆณๅฎ็ฐ็ใ
| Mirror type | Figure | Optic efficiency (calculated over mirror length for 70ยตm source) |
| Standard Montel mirrors | | Eff = 42% |
| Xenocs FOX 3D mirrors | | Eff = 62% |
| Model | Beam size at focus (mm) with 60 ยตm source | Divergence (mrad) | Typical application |
| FOX 3D Cu 14-39 (โฆ) | 0.19 x 0.19 | 5.4 | Protein crystallography (โฆ) Powder diffraction |
| FOX 3D Cu 12-53 | 0.3 x 0.3 | 3 | Protein crystallography (Long Unit Cells) Powder diffraction |
| FOX 3D Mo 10-31 | 0.13 x 0.13 | 4 | Small molecule crystallography High pressure diffraction |
| FOX 3D Ag 10-30 | 0.13 x 0.13 | 3 | Small molecule crystallography High pressure diffraction |
| FOX 3D Cr 8-30 | 0.20 x 0.20 | 6 | Protein crystallography (S-SAD) Stress analysis |
| FOX 1D Cu 12-53 | 0.3 | 3 | XRD, Powder Diffraction |
| Model | Beam size at focus (mm) with 60 ยตm source | Divergence (mrad) | Typical application |
| FOX 2D Mo 25-25 (โฆ) | 0.08 x 0.08 | 5 | Small mollecule crystallography High pressure crystallography |
| FOX 2D Cu 25-25 (โฆ) | 0.08 x 0.08 | 5.3 | Protein crystallography (โฆ) Micro Diffraction, Reflectometry |
| FOX 3D Cu 21-21 HC (โฆ) | 0.08 x 0.08 | 70 x 35 | Rapid x-ray Reflectometry (full beam) Scanning x-ray Reflectometry (with slit) Micro-XRF |
| FOX 3D Cu 28-10 | 0.04 x 0.04 | 17 | Stress Analysis, Micro-diffraction, Micro-XRF |
| FOX 3D Cr 30-8 | 0.04 x 0.04 | 17 | Stress Analysis, Micro-diffraction, Micro-XRF |
| Model | Beam size at focus (mm) with 60 ยตm source | Divergence (mrad) | Typical application |
| FOX 2D Cu 12-INF (โฆ) | 1.2 x 1.2 | 1 | Small angle x-ray scattering (โฆ) High resolution x-ray diffraction (โฆ) Surface scattering (โฆ) Thin film analysis (reflectometry stress) (โฆ) Microdiffraction on synchrotron (โฆ) |
| FOX 2D Mo 25-INF (โฆ) | 0.85 x 1.3 | 0.5 | Small angle x-ray scattering High resolution x-ray diffraction Surface scattering |
| FOX 2D 12-60 L (โฆ) | 0.18 x 0.2 | 0.5 x 2 | High resolution diffraction Small sample analysis |
| FOX 1D Cu 12-INF (โฆ) | 1.2 | 0.8 | High resolution x-ray diffraction, Powder diffraction, Reflectometry, Small angle x-ray scattering |
| Model | Beam size at focus (mm) with 60 ยตm source | Divergence (mrad) | Typical application |
| FOX 1D Cu 12-53 | 0.3 | 3 | XRD, Powder Diffraction |
| Model | Beam size at focus (mm) with 60 ยตm source | Divergence (mrad) | Typical application |
| FOX 1D Cu 12-INF (โฆ) | 1.2 | 0.8 | High resolution x-ray diffraction, Powder diffraction, Reflectometry, Small angle x-ray scattering |
Xenocsๅญๅๅ ถๅจๅคๅฑๆถๅฑใ่กจ้ขๆๅๅๅ ่ฟ็ๆต้ๆๆฏๆน้ข็ไธฐๅฏ็ป้ช๏ผๅผๅไบไธ็ณปๅ้ซๆง่ฝ็XRFๅๆไปช่็ฆ้ใ
ๅญๅๅ ถ็ฌ็น็ๅคๅๆๆฏ๏ผXenocsๅทฒ็ปๅผๅไบๆฐ็ๅ ๆๅๆไปช๏ผๆ้ซไบๆขๆตไธ้๏ผๅขๅคงไบๅฏๆฃๆต้ใ
| Element of interest | Reference |
| O, F, Na, Mg, Al, Si, P, S | XAN-1 |
| Nitrogen | XAN-2 |
| Carbon | XAN-3 |
| Boron | XAN-4 |
| Mg, Al , Si | XAN-5 |
| Be | XAN-6 |
ไธบไบๆดๅฅฝๅฐ่งฃ่ฏป่พๅบๆฐๆฎ๏ผ็งๅญฆๅฎถๅฟ
้กปๆฅๆ็ด่งใๅฏไบคๆตๅๅฏๆฏ่พๅคง้ๅพ็คบ็ๅทฅๅ
ทใ
้่ฟๅฐๆฐๆฎๅค็ไธ้ซ็บง็ด่งๅ่ฝ็็ปๅ๏ผXSACT่ฝฏไปถ็ไฝฟ็จๅฏๅ ๅฟซไปๆฐๆฎ้้ๅฐๅ่กจ็ๅทฅไฝๆต็จใ
้่ฟๅ ็ฝฎ็็งปๆถฒๆบๆขฐ่ๅ่ชๅจ่ฝฏไปถ็ปไปถ๏ผBioXolver็ๆ ๅๅญ็ๅฏไปฅ่ชๅจ่ฃ ๆ ทๅๆต่ฏ๏ผไธบ็จๆทๅธฆๆฅๆด้ซ็ๆต่ฏๆ็ใ
BioXolverๅ ทๆๅผบๅคง็ๆฐๆฎๅค็่ฝฏไปถBioXTAS RAW๏ผไธๅนฟๆณๅบ็จไบBioSAXS็จๆท็พคไฝใ
ๅฎๅฏ่ฟ่กๅบๆฌ็ๆฐๆฎๆไฝๅๆฐๆฎๅๆ(Rgใๅๅญ้็ญ)๏ผไปฅๅไฝฟ็จATSASๆไปถ็้ซ็บงๅๆใ
ๅฏนไบ้ซ้้ๅๆ๏ผ่ชๅจๅๆๅ่ฝๅฏไปฅๅธฎๆจๅๆๅๆฑๆปๅฎ้ช็ปๆใ
Nano-inXiderไฝๆๆฌ็็น็นไธป่ฆๅพ็ไบๅฎ็็ดงๅๅ่ฎพ่ฎกๅๆไฝๆๆฌไฝใ
ย
ๆไฝ็ฎๅใๅช้ๅฐๆจ็ๆ ทๅๆพ็ฝฎๅจๆ ทๅไป้ๅณๅฏใ
ไปชๅจๅฏ่ฟ่ก่ชๅจๆ กๅ๏ผๆ ้็จๆทๅนฒ้ขใ
่ชๅจๅฟซๆท็ๆฐๆฎ้้ๆต็จใXๅฐ็บฟๆฃๅฐๆฐๆฎ่ชๅจๅฝไธๅ๏ผๆ ้็จๆทๆ กๅใ่ฟๆฏ้่ฟไธไธชๅตๅ ฅๅฐๅ จ่ชๅจ่ฎพๅคไธญ็ๅผบๅคง่ฝฏไปถๅฅไปถ๏ผไปฅๅ็ฌ็น็ๅบๅฎๅๆขๆตๅจ้ ็ฝฎๆฅๅฎ็ฐ็ใ
ไปชๅจๅฎๆถๆพ็คบ็็ฒพ็กฎๆฃๅฐๆฐๆฎๅฏ็จไบ่ฟ่กๅฎๆถๅฟซ้็ๆ ทๅๅ้ฆ๏ผๆไฝฟ็จๆไปฌ็XSACT่ฝฏไปถ่ฟ่ก่ฟไธๆญฅ็่พ ๅฉๅๆใๅๆๅ่ฝ้ๆฉๅนฟๆณ๏ผๅช้็นๅปๅ ๆฌกๅฐฑ่ฝๅฟซ้่ทๅพ็บณ็ฑณ็ปๆๅๆฐใ
XSACT็ๆ็้ซ่ดจ้ๅฏๅ่กจ็ๅพ่กจ๏ผๅฏไปฅ้่ฟๆๆพๆไฟๅญๆไปถ่ฝปๆพๅฐๅฏผๅบๅฐๅ ถไปๆๆกฃใ
ไบ่งฃๆดๅคๅ ณไบNano-inXider่ฝฏไปถไฟกๆฏ๏ผๆๅฉไบๆจๆดๅฟซ่ทๅๆ ทๅไฟกๆฏใ
Nano-inXider่ฝๆดๅฟซ่ทๅ็ปๆๆด็ฎๅๅฐ่ฟ่กๆฐๆฎๅๆ
็ฎๅๆ็จใๆบ่ฝๅ็่ฎพ่ฎกๅฏไปฅไฝฟ็ ็ฉถๅฐ่งๆฃๅฐ็ๅญฆ่ ๏ผ็ ็ฉถๆๆ็งๅญฆ็็งๅญฆๅฎถๅๆๆฏไบบๅๅฟซ้ๆๆกใ
ๅ ทๆๅฎๅ จ็่ฟ็จๆไฝ่ฝๅๅ่ชๅจๆ กๅ๏ผNano-inXiderๅฐไบบไธบ่ฏฏๅทฎ้ๅฐๆไฝ๏ผๅนถไฟ่ฏ้็ฐๆงๅๆต้ๅฏ่ฟฝๆบฏๆงใ
ๆฏๅผๆพๆไฝๅฎ้ชๅฎค็็ๆณ้ๆฉใ
