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密閉型微焦点X線源は、環境に優しいハウジング、低い所有コスト、高フラックスにより、優れたコストパフォーマンスを実現し、X線分析装置における標準となりつつあります。 Xenocsは、この技術に基づいた高性能X線ビームデリバリーシステム、 GeniX3Dを開発しました。 GeniX3D は、画期的なデザインとFOX3DT単一反射光学系を組み合わせた業界でもユニークなソリューションです。 GeniX3D は、高いビーム強度、解像度、安定性、統合のしやすさ、信頼性といった優れた特長を有しています。 GeniX3D は、さまざまなX線源およびビーム形状でご利用いただけ、幅広いアプリケーションに対応します。 独自の技術による優れた性能、人間工学的デザインと信頼性を誇る GeniX3D は、世界の主なX線分析装置OEMから高く評価されています。
| Model | Beam size at focus (µm) | Divergence (mrad) | Flux (ph/sec) | Typical application |
| GeniX 3D Cu High Flux * | < 190 | 6 | > 400 x 106 | Protein crystallography Micro stress analysis Powder diffraction |
| GeniX 3D Mo High Flux | < 130 | 5 | > 25 x 106 | Small Molecule crystallography High pressure |
| GeniX 3D Cr High Flux | < 190 | 6 | > 300 x 106 | Stress Analysis |
| GeniX 3D Cu High Convergence * | 60 | 70 x 35 | > 400 x 106 | Rapid X-ray Reflectometry (full beam) Scanning x-ray reflectometry (with slit) Micro x-ray fluorescence Small spot diffraction on thin film |
| GeniX 3D Cu Low Convergence * | < 250 | 3 | > 120 x 106 | Small Angle X-ray Scattering Protein Crystallography |
* 短パルスX線源（V、Cr）にも対応
| Model | Beam size at focus (µm) | Divergence (mrad) | Flux (ph/sec) | Typical application |
| GeniX 3D Cr Micro Spot | < 30 | 17 | > 12 x 106 | Stress Analysis Micro-XRF Micro-XRD |
| GeniX 3D Cu Micro Spot | < 30 | 17 | > 18 x 106 | Stress Analysis Micro-XRF Micro-XRD |
| GeniX 3D Mo Micro Spot | < 55 | 10 | > 1.8 x 106 | Micro-XRF Micro-XRD |
| GeniX 3D Cu High Convergence * | 60 | 70 x 35 | > 400 x 106 | Rapid X-ray Reflectometry (full beam) Scanning x-ray reflectometry (with slit) Micro x-ray fluorescence Small spot diffraction on thin film |
* 短パルスX線源（V、Cr）にも対応
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| Model | Detailed specifications |
| Synchrotron scatterless slits (♦) | Please contact us for any technical information Discover what our customers say about it! |
| X-ray alignment camera (♦) | Please contact us for any technical information |
| Pin Diode detector (♦) | Please contact us for any technical information |
| Beam stop with integrated Pin Diode | Please contact us for any technical information |
当社は、数々の国際特許と14年あまりに及ぶ研究開発に基づき、業界唯一の単一反射多層膜光学系を開発しています。これらの光学機器では一般に、標準的な多反射光学系に比べて効率が50%以上高くなります。
Xenocsは、自社独自の複製技術により、従来の製造技術では不可能であった比類ない性能を誇る光学設計を実現します。
| Mirror type | Figure | Optic efficiency (calculated over mirror length for 70µm source) |
| Standard Montel mirrors |  | Eff = 42% |
| Xenocs FOX 3D mirrors |  | Eff = 62% |
| Model | Beam size at focus (mm) with 60 µm source | Divergence (mrad) | Typical application |
| FOX 3D Cu 14-39 (♦) | 0.19 x 0.19 | 5.4 | Protein crystallography (♦) Powder diffraction |
| FOX 3D Cu 12-53 | 0.3 x 0.3 | 3 | Protein crystallography (Long Unit Cells) Powder diffraction |
| FOX 3D Mo 10-31 | 0.13 x 0.13 | 4 | Small molecule crystallography High pressure diffraction |
| FOX 3D Ag 10-30 | 0.13 x 0.13 | 3 | Small molecule crystallography High pressure diffraction |
| FOX 3D Cr 8-30 | 0.20 x 0.20 | 6 | Protein crystallography (S-SAD) Stress analysis |
| FOX 1D Cu 12-53 | 0.3 | 3 | XRD, Powder Diffraction |
| Model | Beam size at focus (mm) with 60 µm source | Divergence (mrad) | Typical application |
| FOX 2D Mo 25-25 (♦) | 0.08 x 0.08 | 5 | Small mollecule crystallography High pressure crystallography |
| FOX 2D Cu 25-25 (♦) | 0.08 x 0.08 | 5.3 | Protein crystallography (♦) Micro Diffraction, Reflectometry |
| FOX 3D Cu 21-21 HC (♦) | 0.08 x 0.08 | 70 x 35 | Rapid x-ray Reflectometry (full beam) Scanning x-ray Reflectometry (with slit) Micro-XRF |
| FOX 3D Cu 28-10 | 0.04 x 0.04 | 17 | Stress Analysis, Micro-diffraction, Micro-XRF |
| FOX 3D Cr 30-8 | 0.04 x 0.04 | 17 | Stress Analysis, Micro-diffraction, Micro-XRF |
| Model | Beam size at focus (mm) with 60 µm source | Divergence (mrad) | Typical application |
| FOX 2D Cu 12-INF (♦) | 1.2 x 1.2 | 1 | Small angle x-ray scattering (♦) High resolution x-ray diffraction (♦) Surface scattering (♦) Thin film analysis (reflectometry stress) (♦) Microdiffraction on synchrotron (♦) |
| FOX 2D Mo 25-INF (♦) | 0.85 x 1.3 | 0.5 | Small angle x-ray scattering High resolution x-ray diffraction Surface scattering |
| FOX 2D 12-60 L (♦) | 0.18 x 0.2 | 0.5 x 2 | High resolution diffraction Small sample analysis |
| FOX 1D Cu 12-INF (♦) | 1.2 | 0.8 | High resolution x-ray diffraction, Powder diffraction, Reflectometry, Small angle x-ray scattering |
| Model | Beam size at focus (mm) with 60 µm source | Divergence (mrad) | Typical application |
| FOX 1D Cu 12-53 | 0.3 | 3 | XRD, Powder Diffraction |
| Model | Beam size at focus (mm) with 60 µm source | Divergence (mrad) | Typical application |
| FOX 1D Cu 12-INF (♦) | 1.2 | 0.8 | High resolution x-ray diffraction, Powder diffraction, Reflectometry, Small angle x-ray scattering |
Xenocsは、多層膜コーティングおよび表面加工における豊富な経験と先端計測技術に基づき、高性能XRF蛍光分析用光学系を広範囲にわたって開発しています。
自社独自の複製技術を生かして開発された新しい分析器の構造により、検出下限値と測定処理能力が向上します。
| Element of interest | Reference |
| O, F, Na, Mg, Al, Si, P, S | XAN-1 |
| Nitrogen | XAN-2 |
| Carbon | XAN-3 |
| Boron | XAN-4 |
| Mg, Al , Si | XAN-5 |
| Be | XAN-6 |
| Source | Microfocus sealed tube: Cu, 30W/30µm*, point focus. (* DIN EN 12543-5)MetalJet source D2+ (Ga).Motorized Dual source or triple source (Cu/Mo/Cr/Ga). |
| Optics | Patented 2D single reflection multilayer optics. |
| Detector | In-vacuum motorized 3-axis detectors for 2D SAXS/WAXS (Q-Xoom):--Pilatus3 R 300K hybrid photon counting detector--Eiger2 R (1M, 4M) hybrid photon counting detectorsOptional WAXS detectors for SWAXS:--Pilatus3 R 100K hybrid photon counting detector--Motorized 3-axis Eiger2 R 500K hybrid photon counting detector |
| Sample chamber | Large vacuum chamber.On-axis sample viewing (parallax free).Attachments for operation of sample in air. |
| Key features | Clean Beam technology: high flux and low background beamline.Beamstopless measurement: SAXS acquisition continuously without any beamstop.Q-Xoom: Automatic change of measurement configuration over all instrument Q-range with no movement of sample measuring position.Virtual detector mode: surfaces of detection > 200 mm² x 200 mm². |
| Measurement capability | Nanoparticles size up to 300 nm or 500 nm in diameter depending on Xeuss model. Nanoparticles size up to > 4.5 microns with optional motorized Bonse-Hart module for automatic sequential USAXS/SAXS measurements.Scattering measurements up to 2Ɵ>70° with Q-Xoom. |
| Sample environment | Standard holders (multi-samples): solids, capillaries, powders.Sample holders for powders and gels.Flowcells for liquids: --- Low noise flowcell --- Capillary flowcell --- Automatic Sample ChangerTemperature stages: --- Multi-purpose X-Ray Temperature Stage (-30°C to 150°C) --- High temperature sample stage (-150°C to 350°C) --- Extended high temperature sample stage (amb - 1000°C)Tensile Stage (0-200N).Humidity stage (10%-90% from ambient to 60°C).Shear stageTemperature compatible GiSAXS stageOther sample stages available under request |
| Software | Acquisition software with automatic data reduction in absolute units and live data display.XSACT (X-ray Scattering Analysis and Calculation Tool) for data analysis and interpretation. |
| General parameters | Models & Footprint : Xeuss 3.0 C (1 m x 3 m), HR (1 m x 5 m), UHR (1 m x 8 m). Maximum power consumption: < 3000 W (single phase power) |
| Source and optics | Microfocus sealed tube: Cu, 30W/30µm*, point focus. (* DIN EN 12543-5)Patented 2D single reflection multilayer optics. |
| Detector | Dectris Pilatus 3 hybrid photon counting detectors.Two fixed detectors for continuously and simultaneously.SAXS and WAXS acquisition up to 2θ=60°. |
| Beam Path | Windowless beam path entirely under vacuum from beam delivery system to detector sensor |
| Key features | Clean Beam technology: high flux and low background beamline.Beamstopless measurement: SAXS acquisition continuously without any beamstop.Virtual detector mode: > 200° azimuth coverage with rotation of sample. |
| Measurement capability | Nanoparticles size up to 250 nm in diameter. |
| Sample environment | Standard holders: solids, capillaries, powders.Sample holders for powders and gels.Flow cells for liquids:--- Low noise flow cell--- Capillary flow cell--- Automatic Sample ChangerTemperature stages:--- Multi-purpose X-Ray Temperature Stage (-30°C to 150°C)--- High temperature sample stage (-150°C to 350°C)--- Extended high temperature sample stage (amb - 1000°C)Tensile Stage (0-200N).GiSAXS stage compatible with high temperature sample stage.Custom stages on request. |
| Software | Acquisition software with automatic data reduction in absolute units and live data display.XSACT (X-ray Scattering Analysis and Calculation Tool) for data analysis and interpretation. |
| General parameters | Fooprint: < 1x1 m².Weight: ~ 520 kg.Maximum power consumption: < 2000 W (single phase power).Self-contained: no external fluids required. |
| Warranty | Two years warranty and three years on X ray source. |
