Vol.11 - Spring Issue 2011
Xenocs and CEA-Leti are launching a joint application lab
After three years of active collaboration for the development of a new generation of High brightness X-Ray source, Xenocs and CEA-Leti have decided to strengthen their relationship by setting up a joint X-ray application lab.
A 4 circle high precision diffractometer designed by CEA-Leti and founded by the French National Agency (ANR) through the “Recherche Technologique de Base” program will be equipped with the most advanced X-ray beam delivery systems and optical components from Xenocs to perform a large variety of XRD and XRF measurement (Fig. 1).
This joint application lab, located at the NanoCharacterization Platform in Minatec Campus, will be dedicated to the validation of Xenocs advanced products in various customer applications as well as the development of new characterization techniques for X-ray material analysis. It will give to CEA-Leti access to advanced characterization capabilities for its research and development projects in the field of Microelectronics and Micro Electro Mechanicals Systems (MEMS).
Thanks to this collaboration, Xenocs will benefit from the unique CEA-Leti facilities and expertise to push further the performance of its products, develop new concepts and designs, explore new applications and advanced characterization techniques. “The development of new products requires an in-depth understanding of the application of our customers. This joint application lab with CEA-Leti represents a unique opportunity for the company to push further its technologies and product concepts” Frederic Bossan, Co-founder of Xenocs, Marketing and Sales Director.
This joint application lab will give CEA-Leti access to Xenocs most advanced products for its own research purposes. “We decided to continue the collaboration we have with Xenocs since 3 years in the framework of a FUI (Fonds Unique Interministériel) - Minalogic program called HIBRIX (HIgh BRIlliance X-ray source) by launching this joint application lab. It represents a real opportunity for CEA-Leti to set up a complete and at the state of the art x-ray characterization platform. Fully complementary with the other techniques available on the NanoCharacterization Platform, this home-lab system is a real breakthrough for the R&D projects we are running and that require advanced x-ray characterization capabilities” said Jean-Claude Royer, Head of characterization Department of CEA-LETI.
Some of the preliminary results achieved in the joint application lab will be presented during the next conferences Frontiers of Characterization and Metrology for Nanoelectronics to be held in Grenoble and European Material Research Society (May 2011). These results include characterization of patterned microelectronic thin film structures by combined XRD and XRF measurements with a unique association of short counting times and high spatial resolution (Fig. 2 a-b are shown as an illustration of such measurements). The benefits of these characterization methods for laboratory applications will be discussed for practical microelectronic applications.
This collaboration with CEA-Leti represents a new step in the development of the company. “This joint application lab is a fantastic tool to validate our product in customer applications. It will contribute to reduce risks for our customers and accelerate the adoption of our most advanced solutions” Frédéric Bossan, Co-founder of Xenocs, Marketing and Sales Director.
About CEA-Leti
CEA is a French research and technology public organization, with activities in four main areas: energy, information technologies, healthcare technologies and defense and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m2 state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, CEA-Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,500 patent families. For more information about Leti, please visit www.leti.fr .
