X-ray fluorescence equipments can be divided in two main categories of equipments: energy dispersive spectrometers (ED XRF) and wavelength dispersive spectrometers (WD XRF).
Multilayer optics have been used for many years in WDXRF for analysis of low Z materials (from Boron to Si typically). Modern Applications require high performance components with well calibrated and repeatable performances.
The use of x-ray optics in EDXRF, for monochromatic excitation, is an emerging technologies of growing interest in particular in micro-XRF applications where x-ray optics are necessary in order to get a sufficient signal. When coupled to microfocus sources, multilayer optics can provide an intense monochromatic beam focused on a very small spot (typically smaller than 100 microns). Such a beam can allow benefit the detection of very low concentration of elements in a matrix or the thickness measurement of very thin layers on a very small samples areas.
Xenocs unique technology and industrial processes for reliable XRF components
With its high level of expertise in multilayer coatings, and its industrial ISO certified processes, XENOCS has developed a large range of analyzer optics for the detection of light elements .
Xenocs proprietary replication technology allows to bring to the market advanced solutions for monochromatic excitation and high performance EDXRF analyzers.
Please have a look on the documentation below to know more about our product range and capabilities for WDXRF analyzers and EDXRF excitation optics.