Grazing incidence XRD and reflectometry

Grazing Incidence x-ray diffraction (GIXRD) and reflectometry (XRR) are commonly used for investigation of thin films on flat substrates. However, these techniques are limited by experimental time and large surface of measurement on sample (beam footprint).

GeniX3D: Unabling solution for high performance GIXRD and XRR

With extensive experience in semiconductor metrology applications, Xenocs offers a unique product range for this application.

Taking complete benefit from Xenocs replication technology, the GeniX 3D implements advanced multilayer optics for fast high quality grazing incidence XRD and reflectometry measurement providing additional mapping capability.

The small beam footprint provided by GeniX 3D in combination with a curved or linear detector emphasize the asset of this setup to perform fast, high data quality grazing incidence measurements with the advantage of avoiding mechanical movement of the detector, reduced experimental time and with the capability of having a small beam footprint.

Customer feedback

Please have a look at the application notes below to learn more through customer cases about the performance of our products for your application.

Grazing incidence XRD and reflectometry

File	Title
	Monitoring of dehydration kinetics in clays [06/2009]
	Fast mapping GIXRD and XRR at CEA-LETI [07/2010]
	XRD stress analysis of modern nano-sized coatings at OC Oerlikon Balzers AG [08/2011]