The GeniX Mo Low Divergence system combines a high brilliance micro-focus X-ray source with a Xenocs industry-proven single reflection multilayer optic to deliver an intense beam with very low divergence, making it ideal for small angle X-ray scattering or for high resolution X-ray diffraction when coupled with a crystal.

A distinct advantage of the GeniX beam over standard line-focusing systems is that the GeniX provides a smaller beam without using beam-limiting slits, a result of the optic that provides a beam with low divergence in both the vertical and horizontal planes.

The proprietary cooling technique and smart power management extend the source lifetime and lower the cost of ownership. The intuitive user interface of the control unit provides powerful functionality for either standalone or integrated use.

Due to its unprecedented stability and reliability, the GeniX Mo Low Divergence provides a significant performance advantage over existing sealed tube based configurations, making it a reliable, cost-effective, and low maintenance solution for small angle X-ray scattering and high resolution diffraction applications.

If you have any questions or if you would like to know more about the GeniX CU Low Divergence solution please contact us.