The GeniX Mo High Flux system combines a high brilliance micro-focus X-ray source with a Xenocs industry-proven single reflection multilayer optic, thus achieving a very small focal spot with optimum convergence.
The use of the Xenocs optic leads to significant improvements over graphite solutions. The proprietary cooling technique and smart power management extend the source lifetime and lower the cost of ownership. The intuitive user interface of the command and control unit provides powerful functionality for either standalone or integrated use.
Due to its unprecedented stability and reliability, the GeniX Mo High Flux provides a significant performance increase over traditional sealed tubes, making it a reliable, cost-effective, and low maintenance alternative to high power rotating anode sources.
The GeniX Mo High Flux successfully replaces traditional systems and offers clear advantages for a number of applications such as small molecule or high pressure diffraction.
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